Mixed films of TiO 2 –SiO 2 deposited by double electron-beam coevaporation

摘要: We used double electron-beam coevaporation to fabricate TiO2–SiO2 mixed films. The deposition process included oxygen partial pressure, substrate temperature, and rate, all of which were real-time computer controlled. optical properties the films varied from pure SiO2 TiO2 as composition accordingly. X-ray diffraction showed that have amorphous structure with a content low 11%. Atomic force microscopy film has smoother surface than because its structure.Linear Bruggeman's effective medium approximation models fit experimental data better other models.