Study of Optical and Electrical Properties of Nickel Oxide (NiO) Thin Films Deposited by Using a Spray Pyrolysis Technique

摘要: Nickel oxide (NiO) thin film has been deposited on a glass substrate at temperature of 390°C ± 10°C using simple and inexpensive spray pyrolysis technique. Nickel nitrate salt solution (Ni(NO3)2·6H2O) was employed to prepare the films thickness was in order of 200 5 nm. The structural, optical electrical properties NiO were investigated X-ray diffraction (XRD), visible spectrum, DC conductivity and Seebeck effect measurements. results show that diffraction techniques have shown prepared is polycrystalline structure type cubic phase. measurements (transmittance (T) absorbance (A)) higher transmittance 37.4% within the wavelength range (300 - 900 nm). Also absorbance is 77.7%. room temperature conductivity 1.3 × 10-5 (Ω·cm)-1, and also all are p-type due negative Seebeck coefficient.