作者: Chin-Te Kuo , Hsien-Wen Liu , Yi-Nan Chen
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摘要: A trench MOS structure is provided. The includes a substrate, an epitaxial layer, trench, gate isolation, gate, guard ring and reinforcement within the ring. substrate has first conductivity type, side second opposite to side. layer type disposed on in layer. isolation covers inner wall of trench. type. electrically insulating material