作者: Hye-Jin Jo , Jong-Chul Park , O-Ik Kwon , Dong-Hyun Kim
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摘要: A shower head for adjusting distribution of a reactant gas in process region semiconductor manufacturing reaction chamber, wherein top plate has port introducing the into chamber; face plate, having through holes, disposed opposite region; first baffle between and capable moving up or down, surface that defines gap forming lateral flow passage; second controller determining widths gaps.