Thin coatings for use in semiconductor integrated circuits and processes as antireflection coatings consisting of tungsten silicide
作者： Aubrey L. Helms , Michael F. Brady
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摘要: An antireflection coating (21) for use in integrated circuit processing consists of a film tungsten silicide (WSi 0 .45) or silicon nitride (WSiN). These coatings are preferably made by sputtering, with the being sputtering nitrogen-containing atmosphere.
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