作者: I G Gale , J B Clegg , S Mugford , C D Maxey , S Barton
DOI: 10.1088/0268-1242/8/1S/061
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摘要: Doped homo- and heterostructures of CdxHg1-xTe (CMT) are required for some types new-generation devices. These structures have been grown by metal organic vapour phase epitaxy (MOVPE) at approximately 360 degrees C onto both CdTe GaAs (buffered with CdTe) substrates. The were produced using acceptor donor doping arsenic iodine respectively, the junctions formed following annealing in mercury to eliminate vacancies. This paper summarizes progress characterizing these terms x electrical behaviour.