Generalized ellipsometry and the 4 × 4 matrix formalism

作者: D.J. De Smet

DOI: 10.1016/0039-6028(76)90454-4

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摘要: Abstract The 4 × matrix formalism described by Berreman and others provides a method of determining the reflection transmission properties general stratified anisotropic materials. This formalism, when combined with work Azzam Bashara on generalized ellipsometry, can be used to predict extinction settings nulling ellipsometer for light from virtually any type film covered surface provided that is flat films are uniform. In present reviewed equations necessary null an ellipsometer. Examples application these calculations optically active biaxial also presented.

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