Effect of Hydrogen Reduction on Characteristics of Cu Thin-Films Deposited by RF-Driven Ar/H2 Atmospheric Pressure Plasma Jet
作者： Hisashi Nakahiro , Peng Zhao , Akihisa Ogino , Wei Zheng , Yuedong Meng
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摘要: … to Cu and/or Cu2O.Moreover, another component around 935.2 eV which assigned to CuO and/or Cu(OH)2 was … As for the atomic composition of bulk material of Cu films, we are now …
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researchgate.net 参考文章(13)
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