Process monitoring during AlNxOy deposition by reactive magnetron sputtering and correlation with the film's properties
作者： Joel Borges , Nicolas Martin , Filipe Vaz , Luis Marques
DOI: 10.1116/1.4863957
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摘要: In this work, AlNxOy thin films were deposited by reactive magnetron sputtering, using an aluminum target and Ar/(N2+O2) atmosphere. The direct current discharge parameters during the deposition process investigated optical emission spectroscopy a plasma floating probe was used. voltage, electron temperature, ion flux, lines recorded for different gas flows, near close to substrate. This information correlated with structural features of deposits as first step in development system control structure properties sputtering. As becomes poisoned, voltage suffers important variation, due modification secondary coefficient target, which is also supported evolution temperature flux target. sputtering yield a...
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