Preparation and characterization of CrNxOy thin films: The effect of composition and structural features on the electrical behavior
作者： F. Vaz , L. Marques , R. Arvinte , J. Borges , R.E. Sousa
DOI: 10.1016/J.APSUSC.2011.05.109
关键词: Chemical engineering 、 Electrical resistivity and conductivity 、 Analytical chemistry 、 Deposition (phase transition) 、 Materials science 、 Cavity magnetron 、 Sputter deposition 、 Transition metal 、 Thin film 、 Sputtering 、 Ionic bonding
摘要: Abstract Metallic oxynitrides have attracted the attention of several researchers in last decade due to their versatile properties. Through addition a small amount oxygen into transition metal nitride film, material's bonding states between ionic and covalent types can be tailored, thus opening wide range electrical, optical, mechanical tribological responses. Among oxynitrides, chromium oxynitride (CrN x O y ) has many interesting applications different technological fields. In present work electrical behavior CrN thin films, deposited by DC reactive magnetron sputtering, were investigated correlated with compositional structural The gas flow, pressure, target potential monitored during deposition order control chemical composition, which depend strongly on sputtering process. Depending particular parameters that selected, it was possible identify three films growth conditions physical resistivity measured at room temperature, found composition samples.
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