Deposition of microcrystalline silicon prepared by hot-wire chemical-vapor deposition: The influence of the deposition parameters on the material properties and solar cell performance
作者： Stefan Klein , Friedhelm Finger , Reinhard Carius , Martin Stutzmann
DOI: 10.1063/1.1957128
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摘要: Microcrystalline silicon (μc-Si:H) of superior quality can be prepared using the hot-wire chemical-vapor deposition method (HWCVD). At a low substrate temperature (TS) 185 °C excellent material properties and solar cell performance were obtained with spin densities 6×1015cm−3 efficiencies up to 9.4%, respectively. In this study we have systematically investigated influence various parameters on rate properties. For purpose, thin films cells at specific filament temperatures pressures (pD), covering complete range from amorphous highly crystalline by adjusting silane concentration. The these chemical reactions in gas phase qualitatively explains behavior structural composition formation defects. particular, propose that is determined product...
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