All ALD TiO 2 -Al 2 O 3 -TiO 2 horizontal slot waveguides for optical sensing
作者： A. Purniawan , P.J. French , G. Pandraud , Y. Huang , P.M Sarro
DOI: 10.1109/ICSENS.2011.6127051
关键词:
摘要: We report for the first time on use of Atomic Layer Deposition (ALD) to produce TiO 2 -AlO 3 -TiO horizontal slot waveguides optical sensors. The propagation losses are measured and found be 18 dB/cm quasi-TM mode. These better than reported in made using PECVD techniques (for materials like SiC similar refractive index as ) with advantage a very accurate layer thickness control thanks ALD process possibility decrease by factor size. field being so confined we investigated allows implementation these slots cantilever based sensor. A sensitivity 0.5 dB/nm is reported.
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