Ion-assisted deposition of MoSx films from laser-generated plume under pulsed electric field
作者： V. Yu. Fominski , V. N. Nevolin , R. I. Romanov , I. Smurov
DOI: 10.1063/1.1330558
关键词:
摘要: The thickness profiles and compositional distributions of MoSx films deposited from a plume generated by pulsed laser irradiation the MoS2 target were investigated at varying fluence constant pulse energy. It was shown that with stoichiometric composition formed sufficiently low (near ionization threshold), increasing caused intricate nonmonotonic variations distribution. A substantial deviation film significant radial gradient sulfur concentration over substrate surface (1
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