Use of e-beam written, reactive ion etched, phase masks for the generation of novel photorefractive fibre gratings
作者： A. Swanton , D.J. Armes , K.J. Young-Smith , C. Dix , R. Kashyap
DOI: 10.1016/0167-9317(95)00297-9
关键词:
摘要: Abstract E-beam field writing strategies have been developed to reduce stitching errors nigligible levels. Applying these strategies, 40mm × 4mm grating structures written onto phase masks which in turn used print gratings into photo-sensitive fibres. Transmission measurements from constant pitch with uniform and single shifts as well chirped are reported.
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sci-hub.se 参考文章(6)
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