Thermally stable volatile film precursors
作者： Thomas Joseph Knisley , Charles H. Winter , Panditha Koralalage Don Mahesh Chinthaka Karunarathne
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摘要: A precursor for the deposition of a thin film by atomic layer is provided. The compound has formula MxLy where M metal and L an amidrazone-derived ligand or amidate-derived ligand. process forming using precursors also
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