Shape and growth rate of monoatomic layers during the electrocrystallization of silver on a screw-disclocation free (111) crystal face

摘要: Monoatomic layers have been deposited by two-dimensional nucleation and growth at overpotentials lower than the critical for means of double pulse potentiostatic technique. Current transients due to monolayer deposition analysed it has concluded that shape monolayers is a triangle enclosed three identical arcs. Out each current transient, rate monoatomic steps enclosing layer determined. A linear dependence on overpotential established. value constant kv = 1.3 cm s−1 V−1 obtained.