作者: S Koveshnikov , Ken Matthews , Kyu Min , DC Gilmer , MG Sung
DOI: 10.1109/IEDM.2012.6479080
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摘要: We have developed novel real-time methodology to determine intrinsic forming and switching characteristics of HfO x based RRAM. Elimination parasitics in 50nm × cross-bar 1T1R devices (C p RRAM for future memory applications.