In situ transmission electron microscopy study of dislocations in a polycrystalline Cu thin film constrained by a substrate
作者： Gerhard Dehm , Eduard Arzt
DOI: 10.1063/1.1289488
关键词:
摘要: … Furthermore, the in situ TEM measurements of the activation … in situ TEM study of a Cu film grown on an amorphous SiNx … observations that the Cu/SiNx interface acted as a dislocation …
scitation.org
core.ac.uk
mpg.de
harvard.edu
aip.org 
sci-hub.se 参考文章(20)
Kwame Owusu-Boahen, Alexander H. King, Tem Study of Yielding in Polycrystalline Gold Thin Films MRS Proceedings. ,vol. 505, pp. 383- 388 ,(1997) , 10.1557/PROC-505-383
T. Muschik, M. Rühle, High-resolution transmission electron microscopy studies of structural modifications in pd-al2o3 interfaces Philosophical Magazine. ,vol. 65, pp. 363- 388 ,(1992) , 10.1080/01418619208201528
T. S. Kuan, M. Murakami, Low temperature strain behavior of Pb thin films on a substrate Metallurgical and Materials Transactions A-physical Metallurgy and Materials Science. ,vol. 13, pp. 383- 391 ,(1982) , 10.1007/BF02643347
S. Mader, P. Chaudhari, Observation of Dislocation Motion in Al Single-Crystal Films Journal of Vacuum Science and Technology. ,vol. 6, pp. 615- 618 ,(1969) , 10.1116/1.1315706
P. Chaudhari, Plastic properties of polycrystalline thin films on a substrate Philosophical Magazine. ,vol. 39, pp. 507- 516 ,(1979) , 10.1080/01418617908239287
F. Ernst, P. Pirouz, A. H. Heuer, HRTEM study of a Cu/Al2O3 interface Philosophical Magazine. ,vol. 63, pp. 259- 277 ,(1991) , 10.1080/01418619108204849
A. Seeger, N.Y. Jin, F. Phillipp, M. Zaiser, The study of self-organization processes in crystals by high-voltage electron microscopy Ultramicroscopy. ,vol. 39, pp. 342- 354 ,(1991) , 10.1016/0304-3991(91)90214-Q
Mauro J. Kobrinsky, Carl V. Thompson, Activation volume for inelastic deformation in polycrystalline Ag thin films Acta Materialia. ,vol. 48, pp. 625- 633 ,(2000) , 10.1016/S1359-6454(99)00403-6
MARIEN, PLITZKO, SPOLENAK, KELLER, MAYER, Quantitative electron spectroscopic imaging studies of microelectronic metallization layers. Journal of Microscopy. ,vol. 194, pp. 71- 78 ,(1999) , 10.1046/J.1365-2818.1999.00476.X
William D. Nix, Mechanical properties of thin films Metallurgical and Materials Transactions A-physical Metallurgy and Materials Science. ,vol. 20, pp. 2217- 2245 ,(1989) , 10.1007/BF02666659