作者: Yang-Shan Tong
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摘要: Disclosed herein are correcting methods and devices for lithography hotspots of the post-routing layout, used detected in layout. At least one two-dimensional pattern changeable size or position each said number local area where it is located selected adjusted, so that simulation value aerial image intensity various areas optimized, as to improve problem caused by hotspots. The derived through calculation with respect a set optical model cells, cell can be determined numerical distribution basic patterns. After adjustment change amount pattern, hotspot calculated cells have been provided, synthesize after change.