Crystallographic analysis of TiNi shape memory alloy thin film for microactuator

摘要: Basic research for the micro actuator using TiNi shape-memory alloy (SMA) is conducted from crystallographic point of view. SMA (TiNi) thin film fabricated by sputtering deposition. The influence substrate temperature on crystal structure verified measuring resistivity-temperature characteristics and X-ray diffraction. Sputtered under a low-temperature condition showed amorphous structure. However, sputtered at high-temperature had lattice, similar phase transformation as regular bulk TiNi. results applying electric current into show that though annealing can encourage crystallization, it not sufficient. >