Morphological and structural characterization of epitaxial α-Fe2O3 (0001) deposited on Al2O3 (0001) by dc sputter deposition
作者： Ik Jae Lee , Jae-Yong Kim , Chungjong Yu , Chang-Hwan Chang , Man-Kil Joo
DOI: 10.1116/1.2013321
关键词:
摘要: We investigated α-Fe2O3 (0001) film growth on α-Al2O3 using a laboratory-built dc faced magnetron sputtering system with x-ray diffraction, reflectivity, and atomic force microscopy (AFM). The films were deposited from iron targets at rate of ∼6.3nm∕min in an ambient argon oxygen mixture. structural properties quality the thin characterized high-resolution synchrotron scattering. Films thinner than 16nm to be found highly strained due large lattice mismatch between substrate 5.8%. This strain was decrease as thickness increased, most released through surface modulation once reached 20nm. epitaxial relationships [0001]‖α-Al2O3 [0001] out-of-plane direction. That display in-plane alignment anticipated for epitaxy isomorphous materials established by verifying that [112¯0] directions coincident. X-ray reflectivity AFM used show layer-by-layer occurs up 11nm despite mismatch.We directions...
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