Cell layout and structure
作者： Jyh-Kang Ting , Liang-Yao Lee , Juing-Yi Wu , Tsung-Chieh Tsai , Sheng-Hsiung Wang
DOI:
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摘要: A post placement abutment treatment for cell row design is provided. In an embodiment a first and second are placed in third fourth into row. After vias connecting power ground rails to the underlying structures analyzed determine if any can be merged or else removed completely. By merging removing closely vias, physical limitations of photolithography may by-passed, allowing smaller formed.
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