Plasma Characteristics of Inductively Coupled Plasma Using Dual-Frequency Antennas
作者： Tae Hyung Kim , Kyong Nam Kim , Anurag Kumar Mishra , Jin Seok Seo , Ho Boem Jeong
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摘要: The plasma characteristics of inductively coupled (ICP) sources operated with dual-frequency antennas frequencies 2 and 13.56 MHz were investigated compared a source single-frequency antenna at MHz. Improved such as higher density, lower potential, electron temperature observed the ICP owing to high absorbed power through driving frequency antenna. Also, variation ratios changed energy distribution. Therefore, when silicon was etched using CF4/Ar, maximum etching selectivity over photoresist could be rf ratio approximately 70% possibly due different gas dissociation for ratios, even though rate increased density. In addition, by instead antenna, uniformity also improved.
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jsap.jp参考文章(29)
Daniel L. Flamm, Dennis M. Manos, Plasma etching : an introduction Academic Press. ,(1989)
H. C. Kim, J. K. Lee, Mode transition induced by low-frequency current in dual-frequency capacitive discharges. Physical Review Letters. ,vol. 93, pp. 085003- ,(2004) , 10.1103/PHYSREVLETT.93.085003
Michael S. Barnes, John C. Forster, John H. Keller, Electron energy distribution function measurements in a planar inductive oxygen radio frequency glow discharge Applied Physics Letters. ,vol. 62, pp. 2622- 2624 ,(1993) , 10.1063/1.109265
K. N. Kim, J. H. Lim, G. Y. Yeom, S. H. Lee, J. K. Lee, Effect of dual frequency on the plasma characteristics in an internal linear inductively coupled plasma source Applied Physics Letters. ,vol. 89, pp. 251501- ,(2006) , 10.1063/1.2405417
Duck Ho Kim, Su Hyun Cho, Nae-Eung Lee, Ki Chung Kwon, ArF Photoresist Deformation in Dual Frequency Superimposed Capacitively Coupled Plasma (DFS-CCP) with Different Frequency Combinations Japanese Journal of Applied Physics. ,vol. 44, pp. 5856- 5865 ,(2005) , 10.1143/JJAP.44.5856
Dae Ho Kim, Chang-Mo Ryu, Sung Hee Lee, Jae Koo Lee, Sustainment of Plasma Density by a Low Magnetic Field in a Dual-Frequency Capacitively Coupled Plasma Japanese Journal of Applied Physics. ,vol. 47, pp. 7005- 7008 ,(2008) , 10.1143/JJAP.47.7005
Yaoxi Wu, M A Lieberman, The influence of antenna configuration and standing wave effects on density profile in a large-area inductive plasma source Plasma Sources Science and Technology. ,vol. 9, pp. 210- 218 ,(2000) , 10.1088/0963-0252/9/2/315
Q. H. Yuan, G. Q. Yin, Y. Xin, Z. Y. Ning, Effects of gas pressure on 60/13.56 MHz dual-frequency capacitively coupled plasmas Physics of Plasmas. ,vol. 18, pp. 053501- ,(2011) , 10.1063/1.3587108
Anurag Mishra, Kyong Nam Kim, Tae Hyung Kim, Geun Young Yeom, Synergetic effects in a discharge produced by a dual frequency?dual antenna large-area ICP source Plasma Sources Science and Technology. ,vol. 21, pp. 035018- ,(2012) , 10.1088/0963-0252/21/3/035018
P C Boyle, A R Ellingboe, M M Turner, Independent control of ion current and ion impact energy onto electrodes in dual frequency plasma devices Journal of Physics D. ,vol. 37, pp. 697- 701 ,(2004) , 10.1088/0022-3727/37/5/008