Evaluation of Surface Passivation Layers for Bulk Lifetime Estimation of High Resistivity Silicon for Radiation Detectors

作者: J.M. Rafí , L. Cardona-Safont , M. Zabala , C. Boulord , F. Campabadal

DOI: 10.4028/WWW.SCIENTIFIC.NET/SSP.131-133.431

关键词:

摘要: In order to identify an appropriate low-temperature surface passivation that could be used for bulk lifetime estimation of high resistivity (HR) (> 1 k·cm) silicon radiation detectors, different passivating layers were evaluated on n-type and p-type standard Czochralski (CZ), HR magnetic CZ float zone (FZ) substrates. Minority carrier measurements performed by means a μW-PCD set-up. The results show SiNx PECVD deposited at low temperatures (≤ 250°C) may evaluate the impact processing steps treatments substrate characteristics detectors. First are obtained about preliminary thermal treatment experiment stability layers, as well potential generation donors minority lifetime.

参考文章(21)
Patel J R, Oxygen in silicon. Int Symp Silicon Mater Sci Technol. pp. 521- 545 ,(1977)
Mikio Taguchi, Kunihiro Kawamoto, Sadaji Tsuge, Toshiaki Baba, Hitoshi Sakata, Masashi Morizane, Kenji Uchihashi, Noboru Nakamura, Seiichi Kiyama, Osamu Oota, HITTM cells?high-efficiency crystalline Si cells with novel structure Progress in Photovoltaics: Research and Applications. ,vol. 8, pp. 503- 513 ,(2000) , 10.1002/1099-159X(200009/10)8:5<503::AID-PIP347>3.0.CO;2-G
Mara Bruzzi, David Menichelli, Monica Scaringella, Jaakko Härkönen, Esa Tuovinen, Zheng Li, Thermal donors formation via isothermal annealing in magnetic Czochralski high resistivity silicon Journal of Applied Physics. ,vol. 99, pp. 093706- ,(2006) , 10.1063/1.2192307
C. Leguijt, P. Lölgen, J.A. Eikelboom, P.H. Amesz, R.A. Steeman, W.C. Sinke, P.M. Sarro, L.A. Verhoef, P.-P. Michiels, Z.H. Chen, A. Rohatgi, Very low surface recombination velocities on 2.5 Ω cm Si wafers, obtained with low-temperature PECVD of Si-oxide and Si-nitride Solar Energy Materials and Solar Cells. ,vol. 34, pp. 177- 181 ,(1994) , 10.1016/0927-0248(94)90038-8
Giulio Pellegrini, P Roy, R Bates, D Jones, K Mathieson, J Melone, V O’Shea, K.M Smith, I Thayne, P Thornton, J Linnros, W Rodden, M Rahman, Technology development of 3D detectors for high-energy physics and imaging Nuclear Instruments & Methods in Physics Research Section A-accelerators Spectrometers Detectors and Associated Equipment. ,vol. 487, pp. 19- 26 ,(2002) , 10.1016/S0168-9002(02)00939-7
I. Martı́n, M. Vetter, A. Orpella, J. Puigdollers, A. Cuevas, R. Alcubilla, Surface passivation of p-type crystalline Si by plasma enhanced chemical vapor deposited amorphous SiC x :H films Applied Physics Letters. ,vol. 79, pp. 2199- 2201 ,(2001) , 10.1063/1.1404406
Z. Chen, S. K. Pang, K. Yasutake, A. Rohatgi, Plasma-enhanced chemical-vapor-deposited oxide for low surface recombination velocity and high effective lifetime in silicon Journal of Applied Physics. ,vol. 74, pp. 2856- 2859 ,(1993) , 10.1063/1.354638
Y. L. Huang, E. Simoen, C. Claeys, J. M. Rafí, P. Clauws, R. Job, W. R. Fahrner, Hydrogen-plasma-induced thermal donors in high resistivity n-type magnetic Czochralski-grown silicon Applied Physics Letters. ,vol. 89, pp. 031911- ,(2006) , 10.1063/1.2227076