Bromine adsorption, reaction, and etching of Cu(100)
作者： C.Y. Nakakura , E.I. Altman
DOI: 10.1016/S0039-6028(96)00950-8
关键词:
摘要: … -temperature dry-etching processes for Cu has delayed the introduction of devices with Cu interconnects (Etching temperatures must be kept low to prevent degradation of polymer etch …
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S. P. Murarka, Metallization: Theory and practice for VLSI and ULSI ,(1992)
P.H. Holloway, J.B. Hudson, Kinetics of the reaction of oxygen with clean nickel single crystal surfaces: I. Ni(100) surface Surface Science. ,vol. 43, pp. 123- 140 ,(1974) , 10.1016/0039-6028(74)90223-4
E. Bauer, Multiple scattering versus superstructures in low energy electron diffraction Surface Science. ,vol. 7, pp. 351- 364 ,(1967) , 10.1016/0039-6028(67)90026-X
E. Zanazzi, F. Jona, D. W. Jepsen, P. M. Marcus, Atomic arrangement in the c ( 2 × 2 ) structure of Cl on Ag(100) Physical Review B. ,vol. 14, pp. 432- 440 ,(1976) , 10.1103/PHYSREVB.14.432
Seongju Park, T. N. Rhodin, L. C. Rathbun, Halide formation and etching of Cu thin films with Cl2 and Br2 Journal of Vacuum Science and Technology. ,vol. 4, pp. 168- 172 ,(1986) , 10.1116/1.573465
N. D. Spencer, P. J. Goddard, P. W. Davies, M. Kitson, R. M. Lambert, A simple, controllable source for dosing molecular halogens in UHV Journal of Vacuum Science and Technology. ,vol. 1, pp. 1554- 1555 ,(1983) , 10.1116/1.572185
Harold F. Winters, Etch products from the reaction on Cl2 with Al(100) and Cu(100) and XeF2 with W(111) and Nb Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. ,vol. 3, pp. 9- 15 ,(1985) , 10.1116/1.583301
O. L. Warren, P. A. Thiel, Structural determination of a NiO(111) film on Ni(100) by dynamical low‐energy electron‐diffraction analysis Journal of Chemical Physics. ,vol. 100, pp. 659- 663 ,(1994) , 10.1063/1.466930
W.‐D. Wang, N. J. Wu, P. A. Thiel, Structural steps to oxidation of Ni(100) Journal of Chemical Physics. ,vol. 92, pp. 2025- 2035 ,(1990) , 10.1063/1.458036
R. A. J. Shelton, Vapour pressures of the solid copper (I) halides Transactions of the Faraday Society. ,vol. 57, pp. 2113- 2118 ,(1961) , 10.1039/TF9615702113