Topotaxial growth of Ti2AlN by solid state reaction in AlN/Ti(0001) multilayer thin films
作者： C. Höglund , M. Beckers , N. Schell , J. v. Borany , J. Birch
DOI: 10.1063/1.2731520
关键词:
摘要: … phase transformation into Ti 2 Al N ( 0001 ) after only 5 min . … + 1 AX n phase thin films were published for Ti 3 Si C 2 . 2. J.-… deposited Al N ∕ Ti ( 0001 ) multilayers during annealing at …
harvard.edu
scitation.org
aip.org
sci-hub.se 参考文章(12)
Louis E. Toth, Transition Metal Carbides and Nitrides ,(1971)
J.-P. Palmquist, U. Jansson, T. Seppänen, P. O. Å. Persson, J. Birch, L. Hultman, P. Isberg, Magnetron sputtered epitaxial single-phase Ti3SiC2 thin films Applied Physics Letters. ,vol. 81, pp. 835- 837 ,(2002) , 10.1063/1.1494865
T. Joelsson, A. Hörling, J. Birch, L. Hultman, Single-crystal Ti2AlN thin films Applied Physics Letters. ,vol. 86, pp. 111913- ,(2005) , 10.1063/1.1882752
Norbert Schell, Johannes von Borany, Jens Hauser, A Two Magnetron Sputter Deposition Chamber Equipped with an Additional Ion Gun for in situ Observation of Thin Film Growth and Surface Modification by Synchrotron Radiation Scattering SYNCHROTRON RADIATION INSTRUMENTATION: Ninth International Conference on Synchrotron Radiation Instrumentation. ,vol. 879, pp. 1813- 1816 ,(2007) , 10.1063/1.2436422
L Hultman, Thermal stability of nitride thin films Vacuum. ,vol. 57, pp. 1- 30 ,(2000) , 10.1016/S0042-207X(00)00143-3
M. Beckers, N. Schell, R. M. S. Martins, A. Mücklich, W. Möller, L. Hultman, Microstructure and nonbasal-plane growth of epitaxial Ti2AlN thin films Journal of Applied Physics. ,vol. 99, pp. 034902- ,(2006) , 10.1063/1.2161943
Michel W. Barsoum, The MN+1AXN phases: A new class of solids Progress in Solid State Chemistry. ,vol. 28, pp. 201- 281 ,(2000) , 10.1016/S0079-6786(00)00006-6
M. Beckers, N. Schell, R. M. S. Martins, A. Mücklich, W. Möller, Phase stability of epitaxially grown Ti2AlN thin films Applied Physics Letters. ,vol. 89, pp. 074101- ,(2006) , 10.1063/1.2335681
M. Pinkas, N. Frage, N. Froumin, J. Pelleg, M. P. Dariel, Early stages of interface reactions between AlN and Ti thin films Journal of Vacuum Science and Technology. ,vol. 20, pp. 887- 896 ,(2002) , 10.1116/1.1472417
S. Ruvimov, Z. Liliental-Weber, J. Washburn, D. Qiao, S. S. Lau, Paul K. Chu, Microstructure of Ti/Al ohmic contacts for n-AlGaN Applied Physics Letters. ,vol. 73, pp. 2582- 2584 ,(1998) , 10.1063/1.122512