Origins of debris and mitigation through a secondary RF plasma system for discharge-produced EUV sources
作者： E Vargas López , BE Jurczyk , MA Jaworski , MJ Neumann , DN Ruzic
DOI: 10.1016/J.MEE.2004.09.005
关键词:
摘要: RF plasma based mitigation has been studied as an improved debris scheme for extreme ultraviolet (EUV) sources. The ionizes sputtered neutral and, when used in conjunction with a collimator (also known foil trap), inhibits that from reaching the collector optics. An ionization fraction of 61+/-3% measured. In addition, increased scattering ion component led to decrease erosive flux diagnostics. Results situ high-precision quartz crystal oscillators, ex surface characterization (Auger, XPS), and secondary is presented series schemes, including trap plasma.
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