THIN-FILM TRANSISTOR, MANUFACTURING METHOD THEREFOR, AND LIQUID-CRYSTAL DISPLAY DEVICE
作者： Hamano Kuniyuki
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摘要: Provided is a thin-film transistor comprising low-temperature polysilicon having low off-current, excellent potential-holding characteristics, power usage, and high operating speed. Also provided are liquid-crystal display device using said method for manufacturing the transistor. The uses an inversely staggered structure with gate electrode, insulation film, channel region, source/drain electrodes formed on top of glass substrate. region comprises film a-Si:H that covers sides film.
lens.org 参考文章(10)
Kyung-sook Jeon, Byung-duk Yang, Eun-Guk Lee, Se-Hwan Yu, Su-Hyoung Kang, Kyoung-Tai Han, Array substrate and method of manufacturing the same ,(2009)
Jerzy Kanicki, Didier Jousse, Thin film transistor having amorphous/polycrystalline semiconductor channel region. ,(1992)
Yoshiaki Okajima, Takashi Aoyama, Nobutake Konishi, Saburo Oikawa, Takaya Suzuki, Kenji Miyata, Genshirou Kawachi, Hidemi Adachi, Thin-film semiconductor device and manufacture thereof ,(1989)
Steven R Droes, Masao Moriguchi, Yasumori Fukushima, 正生 守口, 康守 福島, Yutaka Takato, 裕 高藤, ロイ ドロース スティーブン, Norifumi Tada, 憲史 多田, Semiconductor device, method of manufacturing the same, and display device ,(2006)
記久雄 小野, Kazuhiro Ogawa, 和宏 小川, Kikuo Ono, Thin film semiconductor device, manufacture thereof and liquid crystal display device ,(1991)
Endo Kazumasa, LASER ANNEALING APPARATUS ,(2005)
Wakagi Masatoshi, Nishimura Etsuko, Matsumura Mieko, Suzumura Isao, Kizawa Kenichi, Hanna Junichi, SEMICONDUCTOR LAYER AND SEMICONDUCTOR DEVICE USING THE SAME, AND DISPLAY DEVICE ,(2009)
Miyabayashi Takeshi, Inoue Toyokazu, METHOD OF MANUFACTURING DISPLAY DEVICE ,(2010)
Katayama Mikio, Morimoto Hiroshi, Okamoto Masaya, Tanaka Hirohisa, Taniguchi Koji, THIN FILM SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF ,(1990)
Yamamoto Takumi, Kanbara Minoru, THIN-FILM TRANSISTOR AND ITS MANUFACTURING METHOD ,(2003)