Energy referencing of Auger electron spectra from charging samples by implanted inert gas spectra

作者: Peter J.K. Paterson , P.H. Holloway , Y.E. Strausser

DOI: 10.1016/0378-5963(80)90005-7

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摘要: Abstract The use of implanted, inert-gas-atom Auger peaks for energy referencing on charging substrates has been investigated. Ar implanted into Cu, Au, BeO, Al 2 O 3 , SiO and Si N 4 was studied along with Xe Au . A linear relationship always found plots the an peak from any sample versus or peaks. However, in some cases, slope such deviated significantly unity. within ± 5% unity observed 15 out 19 plots. Thus shift due to 20 eV, can generally be fixed 1 eV using this technique.

参考文章(3)
D. J. Hnatowich, J. Hudis, M. L. Perlman, R. C. Ragaini, Determination of Charging Effect in Photoelectron Spectroscopy of Nonconducting Solids Journal of Applied Physics. ,vol. 42, pp. 4883- 4886 ,(1971) , 10.1063/1.1659869
J. S. Johannessen, W. E. Spicer, Y. E. Strausser, Auger depth profiling of interfaces in MOS and MNOS structures Journal of Vacuum Science and Technology. ,vol. 13, pp. 849- 855 ,(1976) , 10.1116/1.569002