Effect of the substrate temperature in ZrN coatings grown by the pulsed arc technique studied by XRD

摘要: ZrN films were grown by a plasma-assisted repetitive pulsed vacuum arc discharge. The on 304 stainless steel substrates. To grow the coatings, cathode of Zr was used. system is made up reaction chamber with two electrodes placed face to face. A power supply used generate coatings grown, varying substrate temperature (Ts) between 50°C and 260°C. pressure into 3mbar voltage discharge 270V. XRD technique employed study observing variations some parameters as crystallographic texture crystallite size, function Ts. Morphological characteristics analyzed means an atomic force microscopy (AFM), determining thickness grain where it possible observe influence surface strain energies which have great relationship © 2006 Elsevier B.V. All rights reserved.