作者: Hossain Akram , Hirokazu Tatsuoka , Michihiko Kitao , Shoji Yamada
DOI: 10.1063/1.339547
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摘要: Conditions for the preparation of electrochromic tungstic oxide films with high efficiency coloration have been investigated. Tungstic were deposited on glass substrates by rf sputtering in Ar‐O2 mixture from a compressed powder WO3 target. As‐deposited require an ‘‘aging process,’’ which density charges extracted bleaching is smaller than that injected coloring. It considered part protons introduced during aging combine bonds unstable oxygen contained as‐deposited films. After period, sputtered reversible and cycles. Maximum efficiencies are 0.09 0.04 cm2/mC at wavelengths 800 500 nm, respectively. They obtained when atmosphere 0.04–0.05‐Torr total pressure 5% content. At any rate, substrate temperature should be kept 100 °C or less.