Microstructural analysis of WO3 thin films on alumina substrates
作者： M. Gillet , A. Al-Mohammad , C. Lemire
DOI: 10.1016/S0040-6090(02)00250-X
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摘要: Abstract WO3 thin films have been deposited by thermal evaporation on an alumina oxide single crystal and annealed either in oxygen or air. The morphology the crystallographical structure for as-deposited investigated reflection high energy electron diffraction, atomic force microscopy transmission microscopy. During annealing recrystallise undergo important morphological structural changes: exhibit large grains which monoclinic epitaxial orientations. These are made of twinned microdomains, elongated [100] direction resulting a preferential growth along that corresponds to smallest lattice parameter WO3.
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