作者: D Manno , A Serra , M Di Giulio , G Micocci , A Tepore
DOI: 10.1016/S0040-6090(97)01205-4
关键词: Deposition (phase transition) 、 Characterization (materials science) 、 Sputtering 、 Analytical chemistry 、 Oxygen 、 Controlled atmosphere 、 Tungsten trioxide 、 Thin film 、 Argon 、 Chemistry
摘要: … , tungsten oxide thin films were deposited by rf sputtering in various O 2 –Ar atmospheres and at different … Finally, tungsten oxide thin films were tested in controlled atmosphere. The …