Physical and structural characterization of tungsten oxide thin films for NO gas detection

作者: D Manno , A Serra , M Di Giulio , G Micocci , A Tepore

DOI: 10.1016/S0040-6090(97)01205-4

关键词: Deposition (phase transition)Characterization (materials science)SputteringAnalytical chemistryOxygenControlled atmosphereTungsten trioxideThin filmArgonChemistry

摘要: … , tungsten oxide thin films were deposited by rf sputtering in various O 2 –Ar atmospheres and at different … Finally, tungsten oxide thin films were tested in controlled atmosphere. The …

参考文章(21)
M.D. Antonik, J.E. Schneider, E.L. Wittman, K. Snow, J.F. Vetelino, R.J. Lad, Microstructural effects in WO3 gas-sensing films Thin Solid Films. ,vol. 256, pp. 247- 252 ,(1995) , 10.1016/0040-6090(94)06316-8
M Di Giulio, D Manno, G Micocci, A Serra, A Tepore, Gas-sensing properties of sputtered thin films of tungsten oxide Journal of Physics D. ,vol. 30, pp. 3211- 3215 ,(1997) , 10.1088/0022-3727/30/23/005
Hossain Akram, Hirokazu Tatsuoka, Michihiko Kitao, Shoji Yamada, Preparation and aging of sputtered tungstic oxide films Journal of Applied Physics. ,vol. 62, pp. 2039- 2043 ,(1987) , 10.1063/1.339547
K. Miyake, H. Kaneko, Y. Teramoto, Electrical and optical properties of reactively sputtered tungsten oxide films Journal of Applied Physics. ,vol. 53, pp. 1511- 1515 ,(1982) , 10.1063/1.330649
E. Salje, The orthorhombic phase of WO3 Acta Crystallographica Section B Structural Crystallography and Crystal Chemistry. ,vol. 33, pp. 574- 577 ,(1977) , 10.1107/S0567740877004130
D. Manno, A. Serra, M. Di Giulio, G. Micocci, A. Taurino, A. Tepore, D. Berti, STRUCTURAL AND ELECTRICAL PROPERTIES OF SPUTTERED VANADIUM OXIDE THIN FILMS FOR APPLICATIONS AS GAS SENSING MATERIAL Journal of Applied Physics. ,vol. 81, pp. 2709- 2714 ,(1997) , 10.1063/1.363973
Lidia Armelao, Renzo Bertoncello, Gaetano Granozzi, Giovanni Depaoli, Eugenio Tondello, Giancarlo Battaglin, High-purity WO3sol–gel coatings: synthesis and characterization J. Mater. Chem.. ,vol. 4, pp. 407- 411 ,(1994) , 10.1039/JM9940400407
C. E. Tracy, D. K. Benson, Preparation of amorphous electrochromic tungsten oxide and molybdenum oxide by plasma enhanced chemical vapor deposition Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 4, pp. 2377- 2383 ,(1986) , 10.1116/1.574080
Michiyoshi Tanaka, Kenji Tsuda, Convergent-beam electron diffraction ,(1985)