Heater‐Free and Substrate‐Independent Growth of Vertically Standing Graphene Using A High‐Flux Plasma‐Enhanced Chemical Vapor Deposition

摘要: Vertically standing graphene (VSG) films have demonstrated various appealing functionalities on the basis of excellent electrical/thermal conductivity and electrochemical/catalytic properties, owing to their unique morphology, preferable orientation basal planes, adequate defects as effective catalytic sites. Most fabrication processes for VSG suffer from disadvantage high processing temperature, difficulty in structural control, or poor scalability, which limits many potential applications. Herein, a scalable high‐flux plasma‐enhanced chemical vapor deposition system is designed, with streamlined magnetic field enable uniform ion density over spatially extended plasma flux, facilitates large‐area structurally tuned independent substrate materials without additional heating, first time. The orientation, density, degree order as‐fabricated can be tailored through adjusting environment, turn affects crystallization mechanisms. Such low‐temperature synthesized are high‐performance anode sodium batteries, achieving capacity retention 86% after 2000 cycles at current 1 A g−1. It expected that would great electrochemical applications request sites together favorable ions electrons.