Remote hydrogen microwave plasma chemical vapor deposition from methylsilane precursors. 2. Surface morphology and properties of deposited a-SiC:H films
作者： A.M. Wrobel , A. Walkiewicz-Pietrzykowska , P. Uznanski
DOI: 10.1016/J.TSF.2014.04.089
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摘要: … = 300 C seem to be suitable coatings for tribological application. … = 300–400 C may be useful as scratch-resistant protective coatings for glass optical elements and tribological coatings …
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sci-hub.se 参考文章(47)
A. M. Wróbel, Surface Free Energy of Plasma-Deposited Thin Polymer Films Springer, Boston, MA. pp. 197- 215 ,(1983) , 10.1007/978-1-4615-7584-9_12
T. A. Pomorski, B. C. Bittel, C. J. Cochrane, P. M. Lenahan, J. Bielefeld, S. W. King, Defects and electronic transport in hydrogenated amorphous SiC films of interest for low dielectric constant back end of the line dielectric systems Journal of Applied Physics. ,vol. 114, pp. 074501- ,(2013) , 10.1063/1.4818480
L Boufendi, A Bouchoule, Particle nucleation and growth in a low-pressure argon-silane discharge Plasma Sources Science and Technology. ,vol. 3, pp. 262- 267 ,(1994) , 10.1088/0963-0252/3/3/004
M.J. Loboda, M.K. Ferber, Characterization of the mechanical properties of a –SiC: H films Journal of Materials Research. ,vol. 8, pp. 2908- 2915 ,(1993) , 10.1557/JMR.1993.2908
P.J. Burnett, D.S. Rickerby, The relationship between hardness and scratch adhession Thin Solid Films. ,vol. 154, pp. 403- 416 ,(1987) , 10.1016/0040-6090(87)90382-8
Stephane Scordo, Michel Ducarroir, René Berjoan, Jean Louis Jauberteau, Microwave Plasma CVD in the System Si-C-H-Ar: Effect of Process Parameters† Chemical Vapor Deposition. ,vol. 3, pp. 119- 128 ,(1997) , 10.1002/CVDE.19970030303
A. M. Wróbel, S. Wickramanayaka, K. Kitamura, Y. Nakanishi, Y. Hatanaka, Structure–Property Relationships of Amorphous Hydrogenated Silicon–Carbon Films Produced by Atomic Hydrogen–Induced CVD from a Single-Source Precursor Chemical Vapor Deposition. ,vol. 6, pp. 315- 322 ,(2000) , 10.1002/1521-3862(200011)6:6<315::AID-CVDE315>3.0.CO;2-7
A. M. Wróbel, A. Walkiewicz-Pietrzykowska, J. E. Klemberg-Sapieha, Y. Nakanishi, T. Aoki, Y. Hatanaka, Remote Hydrogen Plasma Chemical Vapor Deposition from (Dimethylsilyl)(trimethylsilyl)methane. 1. Kinetics of the Process; Chemical and Morphological Structure of Deposited Silicon−Carbon Films Chemistry of Materials. ,vol. 15, pp. 1749- 1756 ,(2003) , 10.1021/CM021250C
S. Scordo, M. Ducarroir, E. Bêche, R. Berjoan, ON THE NATURE OF MICROWAVE DEPOSITED HARD SILICON-CARBON FILMS Journal of Materials Research. ,vol. 13, pp. 3315- 3325 ,(1998) , 10.1557/JMR.1998.0451
Sunil Wickramanayaka, Yoshinori Hatanaka, Yoichiro Nakanishi, Alexander M. Wrobel, Preparation and Deposition Mechanism of a ‐ SiC : H Films by Using Hexamethyldisilane in a Remote H 2 Plasma Journal of The Electrochemical Society. ,vol. 141, pp. 2910- 2914 ,(1994) , 10.1149/1.2059255