Effects of sputtering power on microstructure and mechanical properties of TiVCr films
作者： Du-Cheng Tsai , Zue-Chin Chang , Bing-Hau Kuo , Yu-Shiuan Deng , Erh-Chiang Chen
DOI: 10.1016/J.VACUUM.2015.11.015
关键词:
摘要: Abstract We investigated the effects of sputtering power on microstructure direct-current magnetron sputter-deposited TiVCr films silicon wafer grown at room temperature. When was 100 W, composite structure with amorphous and body-centered cubic (BCC) crystal phases can be observed. increased to 200 W, almost transformed into columnar structure. Apart from interface region, zone composed bundles fine fibrous structure, whereas BCC contained V-shaped structures without significant element segregation. Results indicated that high favored formation decrease intracolumnar voids. However, a crack occurred, thereby widening intercolumnar The film deposited demonstrates slight improvement mechanical properties.
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