Substrate liquid processing apparatus
作者： Shuichi Nagamine , Nobuhiro Ogata
DOI:
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摘要: A substrate liquid processing apparatus of the present invention includes a process-liquid supply unit selectively supplying plurality types process-liquids to held by holding table, first and second guide cups which are disposed in this order from top configured respectively downward scattering rotating while being table; position adjustment mechanism adjusting positional relationship between table. recovery tank is provided at lower area recovers guided cup. inner peripheral side
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