作者: Woo-Gwang Jung , Hong-Yeol Kim
DOI: 10.1016/J.MEE.2012.02.013
关键词:
摘要: Micro-Raman spectroscopy was used to examine the changes in structural and electrical properties of GaN films exposed high-energy deuterium irradiation. The locations larger structurally damaged regions, at irradiation energy 5MeV 10MeV, were determined by monitoring variations quasi-longitudinal optical phonon frequency. empirical penetration depths after 10MeV approximately 120 [email protected], respectively, where carrier concentrations lower than that pre-irradiated samples. Defect clusters generated crystal through collisions with lattice atoms, acted as traps. sample irradiation, which derived from (QLO) Raman shifts, ranged 5.5x10^1^5~9.0x10^1^5cm^-^3. reduced free concentration irradiated recovered almost its pre-irradiation values annealing 900^oC, whereas only partial recovery observed 10MeV. This study provides insights into degradation mechanism caused particle long-term reliability GaN-based electronic devices.