Analysis of silver thick-film contact formation on industrial silicon solar cells

作者: G. Grupp , D. Biro , G. Emanuel , R. Preu , F. Schitthelm

DOI: 10.1109/PVSC.2005.1488376

关键词:

摘要: The silver thick-film contact is the most widely used front side for industrial silicon solar cells. objective of presented investigations was to improve understanding formation by varying firing process. We therefore introduced an additional temperature plateau in cooling zone. process assessed based on results IV characteristic. Fill factor, series resistance and open circuit voltage were main values taken into consideration. Additionally we earned out specific Corescan measurements. performance cells characterized spectrally resolved internal quantum efficiency measurements thermographic correlated with variations are discussed referring different models current transport mechanism contacts.

参考文章(3)
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