Deposition of nanostructured crystalline and corrosion resistant alumina film on bell metal at low temperature by rf magnetron sputtering
作者： H. Kakati , A.R. Pal , H. Bailung , Joyanti Chutia
DOI: 10.1016/J.APSUSC.2009.04.008
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摘要: Abstract Aluminium oxide films deposited by rf magnetron sputtering for protective coatings have been investigated. The alumina are found to exhibit grainy surface microstructure. grain size, structure and density depend on different system parameters such as argon and/or oxygen flow rate applied power etc. effect of transition the discharge from metallic reactive mode characteristics film is studied. X-ray diffractometry reveals that in poisoned under optimized pressure, crystalline can be grown. Different conditions corrosion resistant aluminium with good adhesion properties. Nanostructured obtained at lower pressure (8 × 10 −4 9 × 10 Torr) sputtering.
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