Synthesis and characterization in AuCu–Si nanostructures

作者: T.E. Novelo , P. Amézaga-Madrid , R.D. Maldonado , A.I. Oliva , G.M. Alonzo-Medina

DOI: 10.1016/J.MATCHAR.2015.01.010

关键词:

摘要: Abstract Au/Cu bilayers with different Au:Cu concentrations (25:75, 50:50 and 75:25 at.%) were deposited on Si(100) substrates by thermal evaporation. The thicknesses of all 150 nm. alloys prepared diffusion into a vacuum oven argon atmosphere at 690 K during 1 h. X-ray diffraction analysis revealed phases AuCu CuSi in the samples after annealing process. mainly obtained for 25:75 at.% samples, meanwhile AuCuII phase dominates 50:50 at.%. Additionally, 75:25 at.%, produce Au2Cu3 Au3Cu phases. formed characterized scanning electron microscopy (SEM), atomic force (AFM), transmission (TEM) energy dispersive spectroscopy (EDS) to study morphology elemental concentration alloys.

参考文章(29)
Karen Maex, Marc van Rossum, Inspec, Properties of Metal Silicides ,(1995)
彭红键, 陶辉锦, 余方新, 李小波, 谢佑卿, 聂耀庄, Electronic structure of Au-Cu alloys 中国有色金属学会会刊:英文版. ,vol. 14, pp. 1041- 1049 ,(2004)
Ahmet Macit Ozenbas, Husniye Guler, Investigating the Formation Mechanisms of Cu0.83Si0.17 Intermetallic Phase Formed at Cu-Si and Cu-(5at%)Nb/Si Interfaces gazi university journal of science. ,vol. 24, pp. 517- 525 ,(2011)
A. I. Oliva, R. D. Maldonado, J. E. Corona, Vacuum oven to control the annealing process in alloyed nanolayers Revista Mexicana De Fisica. ,vol. 53, pp. 318- 322 ,(2007)
W. Pfeiler, B. Sprušil, Atomic ordering in alloys: stable states and kinetics Materials Science and Engineering A-structural Materials Properties Microstructure and Processing. ,vol. 324, pp. 34- 42 ,(2002) , 10.1016/S0921-5093(01)01280-1
Muhammet Uncuer, Hur Koser, Characterization and application of selective all-wet metallization of silicon Journal of Micromechanics and Microengineering. ,vol. 22, pp. 015003- ,(2012) , 10.1088/0960-1317/22/1/015003
L. Stolt, A. Charai, F. M. D’Heurle, P. M. Fryer, J. M. E. Harper, Formation of Cu3Si and its catalytic effect on silicon oxidation at room temperature Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 9, pp. 1501- 1505 ,(1991) , 10.1116/1.577653
J. W. Elmer, T. A. Palmer, E. D. Specht, Direct observations of rapid diffusion of Cu in Au thin films using in situ x-ray diffraction Journal of Vacuum Science and Technology. ,vol. 24, pp. 978- 987 ,(2006) , 10.1116/1.2204926