Nanolithographic templates from diblock copolymer thin films

摘要: We describe a technique for creating thin polystyrene film containing periodic array of cylindrical holes, with hole size approximately 13 nm and lattice constant 27 nm. The starting material is polystyrene‐polybutadiene diblock copolymer, which self‐assembles into hexagonally packed polybutadiene cylinders embedded in matrix. A described previously used to orient the normal plane film. domains are then removed by reaction ozone, attacks double bonds backbone. Films this type could potentially be as templates nanolithography on scale not readily accessed other techniques.