摘要:
aalto.fi 
sci-hub.se 参考文章(158)
Jaakko Niinistö, Miia Mäntymäki, Kaupo Kukli, Leila Costelle, Esa Puukilainen, Mikko Ritala, Markku Leskelä, Growth and phase stabilization of HfO2 thin films by ALD using novel precursors Journal of Crystal Growth. ,vol. 312, pp. 245- 249 ,(2010) , 10.1016/J.JCRYSGRO.2009.10.028
Matti Putkonen, Minna Nieminen, Jaakko Niinistö, Lauri Niinistö, Timo Sajavaara, Surface-Controlled Deposition of Sc2O3 Thin Films by Atomic Layer Epitaxy Using β-Diketonate and Organometallic Precursors Chemistry of Materials. ,vol. 13, pp. 4701- 4707 ,(2001) , 10.1021/CM011138Z
L. Nyns, A. Delabie, G. Pourtois, S. Van Elshocht, C. Vinckier, S. De Gendt, Study of the Surface Reactions in ALD Hafnium Aluminates Journal of The Electrochemical Society. ,vol. 157, ,(2010) , 10.1149/1.3246802
Marika Juppo, Marko Vehkamäki, Mikko Ritala, Markku Leskelä, Deposition of molybdenum thin films by an alternate supply of MoCl5 and Zn Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films. ,vol. 16, pp. 2845- 2850 ,(1998) , 10.1116/1.581430
L. Hiltunen, H. Kattelus, M. Leskelä, M. Mäkelä, L. Niinistö, E. Nykänen, P. Soininen, M. Tiittad, Growth and characterization of aluminium oxide thin films deposited from various source materials by atomic layer epitaxy and chemical vapor deposition processes Materials Chemistry and Physics. ,vol. 28, pp. 379- 388 ,(1991) , 10.1016/0254-0584(91)90073-4
Taek Seung Yang, Wontae Cho, Minchan Kim, Ki-Seok An, Taek-Mo Chung, Chang Gyoun Kim, Yunsoo Kim, Atomic layer deposition of nickel oxide films using Ni(dmamp)2 and water Journal of Vacuum Science and Technology. ,vol. 23, pp. 1238- 1243 ,(2005) , 10.1116/1.1875172
N. Pan, J. Carter, S. Hein, D. Howe, L. Goldman, L. Kupferberg, S. Brierley, K.C. Hsieh, Atomic layer epitaxy of InP using trimethylindium and tertiarybutylphosphine Thin Solid Films. ,vol. 225, pp. 64- 69 ,(1993) , 10.1016/0040-6090(93)90127-B
Matti Putkonen, Titta Aaltonen, Mari Alnes, Timo Sajavaara, Ola Nilsen, Helmer Fjellvåg, Atomic layer deposition of lithium containing thin films Journal of Materials Chemistry. ,vol. 19, pp. 8767- 8771 ,(2009) , 10.1039/B913466B
J.R. Bakke, J.S. King, H.J. Jung, R. Sinclair, S.F. Bent, Atomic layer deposition of ZnS via in situ production of H2S Thin Solid Films. ,vol. 518, pp. 5400- 5408 ,(2010) , 10.1016/J.TSF.2010.03.074
Jenni Harjuoja, Samuli Väyrynen, Matti Putkonen, Lauri Niinistö, Eero Rauhala, Crystallization of bismuth titanate and bismuth silicate grown as thin films by atomic layer deposition Journal of Crystal Growth. ,vol. 286, pp. 376- 383 ,(2006) , 10.1016/J.JCRYSGRO.2005.10.020