Composition and method for production thereof, porous material and method for production thereof, interlayer insulating film, semiconductor material, semiconductor device, and low-refractive-index surface protection film

摘要: Disclosed is a composition comprising hydrolysate of an alkoxysilane compound, siloxane compound represented by Formula (1), surfactant, and element having electronegativity 2.5 or less. In RA RB independently represent hydrogen atom, phenyl group, —CaH2a+1, —(CH2)b(CF2)cCF3 —CdH2d−1, are not both atoms simultaneously, RC RD single bond that links silicon atom oxygen to form cyclic structure, each —(CH2)b(CF2)cCF3, represents integer 1 6, b 0 4, c 10, d 2 n 3 greater.