作者: Yoshito Kurano , Shunsuke Oike , Takeshi Kubota , Kazuo Komura , Masami Murakami
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摘要: A method for modifying a porous film mainly having Si-O bonds wherein thermal treatment is conducted without using metal catalyst by bringing an organic silicon compound into contact with the film. The includes one or more Si-X-Si bond unit (wherein X represents O, NR, CnH2n, C6H4; R CmH2m+1 C6H5; m integer between 1 and 6; n 2) two Si-A units H, OH, OCeH2e+1 halogen atom can be same different within single molecule; e 6). Since obtained this excellent in hydrophobic property mechanical strength, it used as optically functional material electronically material. especially useful semiconductor material, preferably interlayer insulating device.