Auger Analysis of Thermally Oxidized GaAs Surfaces
作者： Ikuo Shiota , Nobuo Miyamoto , Jun‐ichi Nishizawa
DOI: 10.1149/1.2133663
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摘要:
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sci-hub.se 参考文章(1)
T. C. Chandler, R. B. Hilborn, J. W. Faust, The Properties of Silica Diffusion Sources under Oxidizing Ambient Conditions and Their Application to Solar Cell Fabrication Journal of The Electrochemical Society. ,vol. 124, pp. 1409- 1413 ,(1977) , 10.1149/1.2133664