Resists for sub-20-nm electron beam lithography with a focus on HSQ: state of the art
作者： A E Grigorescu , C W Hagen
DOI: 10.1088/0957-4484/20/29/292001
关键词:
摘要: … electron beam exposure are discussed and the influence of various parameters (eg pre-baking, exposure … ultrathin resist layers and when the exposure is performed at high acceleration …
harvard.edu
tudelft.nl
core.ac.uk参考文章(94)
H. W. Kroto, J. R. Heath, S. C. O’Brien, R. F. Curl, R. E. Smalley, C 60 : Buckminsterfullerene Nature. ,vol. 318, pp. 162- 163 ,(1985) , 10.1038/318162A0
D. M. Tennant, Limits of Conventional Lithography Springer, New York, NY. pp. 161- 205 ,(1999) , 10.1007/978-1-4612-0531-9_4
Abraham Ulman, An Introduction to Ultrathin Organic Films: From Langmuir--Blodgett to Self--Assembly ,(1991)
Toru Yamaguchi, Hideo Namatsu, Masao Nagase, Kenji Yamazaki, Kenji Kurihara, A new approach for reducing line-edge roughness by using a cross-linked positive-tone resist international microprocesses and nanotechnology conference. ,vol. 38, pp. 7114- 7118 ,(1999) , 10.1143/JJAP.38.7114
Bernard Yurke, Andrew J. Turberfield, Allen P. Mills, Friedrich C. Simmel, Jennifer L. Neumann, A DNA-fuelled molecular machine made of DNA Nature. ,vol. 406, pp. 605- 608 ,(2000) , 10.1038/35020524
Sander J. Tans, Alwin R. M. Verschueren, Cees Dekker, Room-temperature transistor based on a single carbon nanotube Nature. ,vol. 393, pp. 49- 52 ,(1998) , 10.1038/29954
Jane S. Dietrich, Tiny Tale Gets Grand California Institute of Technology. ,(1986)
George?M. Whitesides, Nanoscience, nanotechnology, and chemistry. Small. ,vol. 1, pp. 172- 179 ,(2005) , 10.1002/SMLL.200400130
Yongqi Hu, Hengpeng Wu, Kenneth Gonsalves, Lhadi Merhari, Nanocomposite resists for electron beam nanolithography Microelectronic Engineering. ,vol. 56, pp. 289- 294 ,(2001) , 10.1016/S0167-9317(01)00420-8
D. M. Eigler, E. K. Schweizer, Positioning single atoms with a scanning tunnelling microscope Nature. ,vol. 344, pp. 524- 526 ,(1990) , 10.1038/344524A0