Plasmodium berghei K173: selection of resistance to naphthoquine in a mouse model.

作者: Hong Wang , Zhu-Chun Bei , Jing-Yan Wang , Wu-Chun Cao

DOI: 10.1016/J.EXPPARA.2010.08.020

关键词:

摘要: Naphthoquine (NQ), as a component of ARCO® which composed NQ and artemisinin, is new 4-aminoquinoline antimalarial synthesized by our institute. Here, naphthoquine-resistant line rodent malaria parasite was selected through exposing Plasmodium berghei Keyberg 173 strain to progressively increased drug pressure. The showed more than 200-fold decreased susceptibility with stable resistance phenotype after 10 serial passages without pressure or when cryopreserved over period 12 months. In cross-resistance assay, the NQ-resistant parasites chloroquine 14.5-fold. These findings imply might be long-term usage in epidemic areas efficacy chloroquine-resistant falciparum should monitored closely.

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