Cobalt substrate processing systems, apparatus, and methods
作者： Avgerinos V. Gelatos , Bhushan Zope , Bo Zheng
DOI:
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摘要: Electronic device processing systems including cobalt deposition are described. One system includes a mainframe having transfer chamber and at least two facets, one or more process chambers adapted to carry out metal oxide removal possibly an annealing processes on substrates, process. Other chamber, load lock coupled the that Additional methods for of substrates described, as numerous other aspects.
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