作者: J. Hafiz , R. Mukherjee , X. Wang , M. Cullinan , J.V.R. Heberlein
DOI: 10.1007/S11051-006-9111-8
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摘要: The synthesis of silicon nanowires that are densely coated with nanoparticles is reported. These structures were produced in a two-step process, using method known as hypersonic plasma particle deposition. In the first step, Ti–Si nanoparticle film was deposited. second step Ti-source switched off, and nanoparticle-coated grew under simultaneous action Si vapor deposition bombardment by nanoparticles. Total process time, including both steps, equaled 5 min, resulted formation dense network randomly oriented covering1.5 cm2 substrate area. composed single-crystal Si. diameters vary over range 100–800 nm. Each nanowire has crystalline TiSi2 catalyst particle, believed to have been solid during growth, at its tip.